By B. Guenther, M. Maier, J. Koeble, A. Bettac (auth.), Christian Joachim (eds.)
This quantity files the 1st foreign Workshop on Atomic Scale Interconnection Machines organised through the ecu built-in undertaking AtMol in June 2011 in Singapore. The 4 classes, mentioned the following in revised contributions through excessive point audio system, span the themes of multi-probe UHV instrumentation, atomic scale nano-material nanowires characterization, atomic scale floor conductance measurements, floor atomic scale mechanical machineries. This cutting-edge account brings educational researchers and engineers entry to the instruments they should be on the leading edge of the atomic scale know-how revolution.
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Extra info for Atomic Scale Interconnection Machines: Proceedings of the 1st AtMol European Workshop Singapore 28th-29th June 2011
Rev. B 78, 165302 (2008) 7. : Single atom extraction by scanning tunneling microscope tip-crash and nanoscale surface engineering. Nano Lett. 4, 1997 (2004) 8. : Surface Conductance Measurements on a MoS2 Surface Using a UHVNanoprobe System. In this volume, (2012) 9. : Solid State Nano Gears Manipulations. In this volume, (2012) 10. : Toward atomic-scale device fabrication in Silicon using scanning probe microscopy. Nano Lett. 4(10), 1969–1973 (2004) 11. : Transformations on clean Si(111) stepped surface during sublimation.
Previously the deposition was done ‘‘outside’’ and gave a lot of contamination to the surface). There are two carousels with 6 slots each are available in the preparation and imprinting chamber to keep samples or tips under vacuum. When the sample is fully prepared for the experiments it is transferred back to the manipulator of the preparation chamber and cooled down to the liquid nitrogen temperature in order to reduce the consumption of the liquid helium at the LT-STM side. With a help of the wobble sticks the sample is transferred to the long magnetic manipulator which connects the preparation chamber with the multiprobe and the LT-STM chambers.
6 a Inside view of the imprinting chamber: the piezo-driven part with MoS2 sample is on the left; on the right side has Si sample; b SEM image of the MoS2 pillars made by nanolithography method; c TEM image of the gold nanoislands transferred from the MoS2 surface to Si surface are known to form the islands of regular shape . The height, shape and lateral dimensions of the islands depend on the MoS2 surface temperature during deposition. At the substrate temperature of 400°C gold is the most uniformed and selfassembled into the triangular islands with a size of tens of nm.
Atomic Scale Interconnection Machines: Proceedings of the 1st AtMol European Workshop Singapore 28th-29th June 2011 by B. Guenther, M. Maier, J. Koeble, A. Bettac (auth.), Christian Joachim (eds.)